The technique which is also named ESCA (Electron Spectroscopy for Chemical Analysis).
It is based on the irradiating the sample with x-rays and detecting the emitted
electrons and their energy distribution. Because the electrons escape depth is about
7 nm, this technique is surface sensitive. The electron energy depends on the atom
they were emitted from and on the chemical environment around this atom. XPS can be
used to analyze the surface chemical structure of polymers.
In the surface modification group of the IAP we use a Kratos Axis 165.
For further information on x-ray photoelectron spectrometry visit
www.polymer-analysis.com/surfaces/xps.html