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> Home > Equipment > Semitechnical plasma reactor (Roth & Rau, Germany)

Semitechnical plasma reactor




Front view of the semitechnical plasma reactor. On the top of it, there is the microwave plasma source with the magnetron (right) and the stub tuner. On the right part of the picture, one can see the controll rack.
Zoom Front view of the semitechnical plasma reactor. On the top of it, there is the microwave plasma source with the magnetron (right) and the stub tuner. On the right part of the picture, one can see the controll rack.
The stainless steel chamber is pumped by a turbomolecular pump and a rotary backing pump. A base pressure of 1e-6 mbar can be realized. The pump speed and by this the pressure in the chamber can be controlled by a butterfly throttle valve. The system can be equiped alternatively with a pulsable microwave (MW) electron cyclotron resonace (ECR) plasma source (Roth & Rau, Germany; 1200 W) or with a down stream radio frequency (RF) source (IAP, 13.56 MHz, 1200W). In both cases the substrate holder can be biased by a DC or RF voltage. All the system parameters including pressure, gas flow, and plasma power are controlled by a computer and can be protocolized.

The front door of the chamber is replaced with the roll-to-roll continuous treatment equipment.
Zoom The front door of the chamber is replaced with the roll-to-roll continuous treatment equipment.
The plasma source and substrate are in a remote configuration, i.e. the substrate is placed outside the main plasma glow zone. The distance in which the material passes the plasma zone can be varied mechanically from outside the chamber. This remote configuration allows a better control of the treatment intensity by the selection of the discharge created active species due to their life times.

With a continuous treatment add-on, wide web materials (films or textiles) can be exposed to the plasma. The material can be up to 30 cm wide. The maximum roll diameter is 26 cm. Both rolls are placed in a separately pumped compartment which allows a better control of the outgassing and drying of the material. Beside the pumping of the main chamber the roll compartment is pumped by a rotary pumps and a roots pump.