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UHV plasma chamber




View on the main chamber without IRRAS equipment. The cylinder on the top is the microwave ECR-source.
Zoom View on the main chamber without IRRAS equipment. The cylinder on the top is the microwave ECR-source.
The ultra high vacuum stainless steel chamber is pumped by a turbomolecular pump to a base pressure of 1 e-8 mbar or better without baking. Samples with a maximum size of 11 by 14 cm2 are introduce via a lood lock. The chamber is equiped with a MW (ECR)-plasma source (Roth & Rau, Germany) which can be operated to up to 300 W microwave power. The power can be modulated with different pulse frequencies and duty times. The plasma source can be mounted to the chamber with a window which allows to perform UV-irradiation experiments.

For process diagnostics, the system includes an energy resolving quadrupol mass spectrometer, an optical emission spectrometer, and an in-situ infrared reflection-absorption system. The sample can be transferred in vacuum to a second high vacuum chamber which is pumped separately by turbomolecular pump. In this chamber the samples can be exposed to various chemicals in order to carry out chemical reactions with the just formed surface structures.